In this work the effect of laser pulse energy on the optical properties of five samples of SiO2 thin film deposited using pulse laser deposition technique was studied. Pulse energies of 100,150,180, 200 and 250 mj with fixed pulse repetition rate and number of pulses of 2 Hz, and 10 pulses, were used. The target to substrate distance and angle were fixed. The film thickness was measured by FESEM, and the transmission spectrum at certain wavelengths for each film was recorded. SiO2 thin films transmission data and the measured film thicknesses were used to deduce their optical properties. The results showed that increasing the pulse energy results in an increase of the film thickness and the morphology of the films becomes more dense and non-smooth at higher pulse energy, also the optical properties showed to be affected by the thickness variation and hence by the pulse energy.
PLD, Laser energy, SiO2 thin films, Optical properties
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